Depth of Focus Formula

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Depth of Focus is a critical parameter that influences the tolerance to variations in the height of the semiconductor wafer. Check FAQs
DOF=k2λlNA2
DOF - Depth of Focus?k2 - Proportionality Factor?λl - Wavelength in Photolithography?NA - Numerical Aperture?

Depth of Focus Example

With values
With units
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Here is how the Depth of Focus equation looks like with Values.

Here is how the Depth of Focus equation looks like with Units.

Here is how the Depth of Focus equation looks like.

1.3013Edit=3Edit223Edit0.717Edit2
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Depth of Focus Solution

Follow our step by step solution on how to calculate Depth of Focus?

FIRST Step Consider the formula
DOF=k2λlNA2
Next Step Substitute values of Variables
DOF=3223nm0.7172
Next Step Convert Units
DOF=32.2E-7m0.7172
Next Step Prepare to Evaluate
DOF=32.2E-70.7172
Next Step Evaluate
DOF=1.30133109247621E-06m
Next Step Convert to Output's Unit
DOF=1.30133109247621μm
LAST Step Rounding Answer
DOF=1.3013μm

Depth of Focus Formula Elements

Variables
Depth of Focus
Depth of Focus is a critical parameter that influences the tolerance to variations in the height of the semiconductor wafer.
Symbol: DOF
Measurement: WavelengthUnit: μm
Note: Value should be greater than 0.
Proportionality Factor
Proportionality Factor is a constant that relates two key parameters: the critical dimension (CD) and the exposure dose.
Symbol: k2
Measurement: NAUnit: Unitless
Note: Value should be greater than 0.
Wavelength in Photolithography
Wavelength in Photolithography refers to the specific range of electromagnetic radiation employed to pattern semiconductor wafers during the semiconductor fabrication process.
Symbol: λl
Measurement: WavelengthUnit: nm
Note: Value should be greater than 0.
Numerical Aperture
Numerical Aperture of an Optical System is a parameter used in optics to describe the ability of an optical system. In the context of semiconductor manufacturing and photolithography.
Symbol: NA
Measurement: NAUnit: Unitless
Note: Value should be greater than 0.

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How to Evaluate Depth of Focus?

Depth of Focus evaluator uses Depth of Focus = Proportionality Factor*Wavelength in Photolithography/(Numerical Aperture^2) to evaluate the Depth of Focus, The Depth of Focus is defined as a critical parameter that influences the tolerance to variations in the height of the semiconductor wafer. It's the range of distances in front of and behind the focal plane where objects appear sufficiently sharp in an image. Depth of Focus is denoted by DOF symbol.

How to evaluate Depth of Focus using this online evaluator? To use this online evaluator for Depth of Focus, enter Proportionality Factor (k2), Wavelength in Photolithography l) & Numerical Aperture (NA) and hit the calculate button.

FAQs on Depth of Focus

What is the formula to find Depth of Focus?
The formula of Depth of Focus is expressed as Depth of Focus = Proportionality Factor*Wavelength in Photolithography/(Numerical Aperture^2). Here is an example- 1.3E+12 = 3*2.23E-07/(0.717^2).
How to calculate Depth of Focus?
With Proportionality Factor (k2), Wavelength in Photolithography l) & Numerical Aperture (NA) we can find Depth of Focus using the formula - Depth of Focus = Proportionality Factor*Wavelength in Photolithography/(Numerical Aperture^2).
Can the Depth of Focus be negative?
No, the Depth of Focus, measured in Wavelength cannot be negative.
Which unit is used to measure Depth of Focus?
Depth of Focus is usually measured using the Micrometer[μm] for Wavelength. Meter[μm], Megameter[μm], Kilometer[μm] are the few other units in which Depth of Focus can be measured.
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