Depth of Focus evaluator uses Depth of Focus = Proportionality Factor*Wavelength in Photolithography/(Numerical Aperture^2) to evaluate the Depth of Focus, The Depth of Focus is defined as a critical parameter that influences the tolerance to variations in the height of the semiconductor wafer. It's the range of distances in front of and behind the focal plane where objects appear sufficiently sharp in an image. Depth of Focus is denoted by DOF symbol.
How to evaluate Depth of Focus using this online evaluator? To use this online evaluator for Depth of Focus, enter Proportionality Factor (k2), Wavelength in Photolithography (λl) & Numerical Aperture (NA) and hit the calculate button.