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Critical Dimension Formula

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Critical Dimension in semiconductor manufacturing refers to the smallest feature size or the smallest measurable size in a given process. Check FAQs

CD = k 1 \cdot \frac{λ l}{NA}

CD - Critical Dimension?k₁ - Process Dependent Constant?λ_l - Wavelength in Photolithography?NA - Numerical Aperture?

Critical Dimension Example

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With units

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Here is how the Critical Dimension equation looks like with Values.

Here is how the Critical Dimension equation looks like with Units.

Here is how the Critical Dimension equation looks like.

485.1883 = 1.56 \cdot \frac{223}{0.717}

485.1883nm = 1.56 \cdot \frac{223nm}{0.717}

485.1883 = 1.56 \cdot \frac{223}{0.717}

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Critical Dimension Solution

Follow our step by step solution on how to calculate Critical Dimension?

FIRST Step Consider the formula

CD = k 1 \cdot \frac{λ l}{NA}

Next Step Substitute values of Variables

∴

CD = 1.56 \cdot \frac{223nm}{0.717}

Next Step Convert Units

∴

CD = 1.56 \cdot \frac{2.2E-7m}{0.717}

Next Step Prepare to Evaluate

∴

CD = 1.56 \cdot \frac{2.2E-7}{0.717}

Next Step Evaluate

∴

CD = 4.85188284518829E-07m

Next Step Convert to Output's Unit

∴

CD = 485.188284518829nm

LAST Step Rounding Answer

∴

CD = 485.1883nm

Critical Dimension Formula Elements

Variables

Critical Dimension

Critical Dimension in semiconductor manufacturing refers to the smallest feature size or the smallest measurable size in a given process.

Symbol: CD

Measurement: LengthUnit: nm

Note: Value should be greater than 0.

Formulas to find Critical Dimension

Process Dependent Constant

Process Dependent Constant refers to a parameter or value that characterizes a specific aspect of the fabrication process and has a significant impact on the performance of semiconductor devices.

Symbol: k₁

Measurement: NAUnit: Unitless

Note: Value should be greater than 0.

Formulas to find Process Dependent Constant

Wavelength in Photolithography

Wavelength in Photolithography refers to the specific range of electromagnetic radiation employed to pattern semiconductor wafers during the semiconductor fabrication process.

Symbol: λ_l

Measurement: WavelengthUnit: nm

Note: Value should be greater than 0.

Formulas to find Wavelength in Photolithography

Numerical Aperture

Numerical Aperture of an Optical System is a parameter used in optics to describe the ability of an optical system. In the context of semiconductor manufacturing and photolithography.

Symbol: NA

Measurement: NAUnit: Unitless

Note: Value should be greater than 0.

Formulas to find Numerical Aperture

Other formulas in MOS IC Fabrication category

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Go MOSFET Unity-Gain Frequency

f t = \frac{g m}{C gs + C gd}

Go Drain Current of MOSFET at Saturation Region

I d = \frac{β}{2} \cdot {(V gs - V th)}^{2} \cdot (1 + λ i \cdot V ds)

Go Channel Resistance

R ch = \frac{L t}{W t} \cdot \frac{1}{μ n \cdot Q on}

How to Evaluate Critical Dimension?

Critical Dimension evaluator uses Critical Dimension = Process Dependent Constant*Wavelength in Photolithography/Numerical Aperture to evaluate the Critical Dimension, The Critical Dimension refers to the smallest dimension or feature size that determines the performance and functionality of the circuit. It is crucial for defining the resolution and accuracy of the fabrication process. Critical Dimension is denoted by CD symbol.

How to evaluate Critical Dimension using this online evaluator? To use this online evaluator for Critical Dimension, enter Process Dependent Constant (k₁), Wavelength in Photolithography (λ_l) & Numerical Aperture (NA) and hit the calculate button.

FAQs on Critical Dimension

What is the formula to find Critical Dimension?

The formula of Critical Dimension is expressed as Critical Dimension = Process Dependent Constant*Wavelength in Photolithography/Numerical Aperture. Here is an example- 4.9E+11 = 1.56*2.23E-07/0.717.

How to calculate Critical Dimension?

With Process Dependent Constant (k₁), Wavelength in Photolithography (λ_l) & Numerical Aperture (NA) we can find Critical Dimension using the formula - Critical Dimension = Process Dependent Constant*Wavelength in Photolithography/Numerical Aperture.

Can the Critical Dimension be negative?

No, the Critical Dimension, measured in Length cannot be negative.

Which unit is used to measure Critical Dimension?

Critical Dimension is usually measured using the Nanometer[nm] for Length. Meter[nm], Millimeter[nm], Kilometer[nm] are the few other units in which Critical Dimension can be measured.

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Critical Dimension Formula

Critical Dimension Example

Critical Dimension Solution

Critical Dimension Formula Elements

Other formulas in MOS IC Fabrication category

How to Evaluate Critical Dimension?

FAQs on Critical Dimension

Variable Name