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Integrated Circuits (IC)
Wavelength in Photolithography in Integrated Circuits (IC) Formulas
Wavelength in Photolithography refers to the specific range of electromagnetic radiation employed to pattern semiconductor wafers during the semiconductor fabrication process. And is denoted by λ
l
. Wavelength in Photolithography is usually measured using the Nanometer for Wavelength. Note that the value of Wavelength in Photolithography is always positive.
Integrated Circuits (IC) formulas that make use of Wavelength in Photolithography
f
x
Critical Dimension
Go
f
x
Depth of Focus
Go
FAQ
What is the Wavelength in Photolithography?
Wavelength in Photolithography refers to the specific range of electromagnetic radiation employed to pattern semiconductor wafers during the semiconductor fabrication process. Wavelength in Photolithography is usually measured using the Nanometer for Wavelength. Note that the value of Wavelength in Photolithography is always positive.
Can the Wavelength in Photolithography be negative?
No, the Wavelength in Photolithography, measured in Wavelength cannot be negative.
What unit is used to measure Wavelength in Photolithography?
Wavelength in Photolithography is usually measured using the Nanometer[nm] for Wavelength. Meter[nm], Megameter[nm], Kilometer[nm] are the few other units in which Wavelength in Photolithography can be measured.
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