Area of Source Diffusion in VLSI Fabrication Formulas

Area of Source Diffusion is defined as net movement of anything from a region of higher concentration to a region of lower concentration area in the source gate. And is denoted by A_s. Area of Source Diffusion is usually measured using the Square Millimeter for Area. Note that the value of Area of Source Diffusion is always positive.

VLSI Fabrication formulas that make use of Area of Source Diffusion

fxTotal Source Parasitic CapacitanceGo

FAQ

What is the Area of Source Diffusion?

Area of Source Diffusion is defined as net movement of anything from a region of higher concentration to a region of lower concentration area in the source gate. Area of Source Diffusion is usually measured using the Square Millimeter for Area. Note that the value of Area of Source Diffusion is always positive.

Can the Area of Source Diffusion be negative?

No, the Area of Source Diffusion, measured in Area cannot be negative.

What unit is used to measure Area of Source Diffusion?

Area of Source Diffusion is usually measured using the Square Millimeter[mm²] for Area. Square Meter[mm²], Square Kilometer[mm²], Square Centimeter[mm²] are the few other units in which Area of Source Diffusion can be measured.

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